Dual-Beam Microscope User Facility

Quanta 3D FEG

 

The W.M. Keck Center for Nanoscale Optofluidics has a dedicated nanofabrication facility in 268 Baskin Engineering that houses our FEI Quanta™ 3D field emission microscope, a versatile, high-resolution, low-vacuum SEM/FIB for 2D and 3D material characterization and analysis.

Innovative electron and ion optics combined with Quanta’s unique environmental SEM operating mode will expand your laboratory’s capabilities, providing better, faster and more comprehensive materials characterization, analysis and sample preparation.

Our staff scientist, Dr. Tom Yuzvinsky, is on hand to assist with imaging, interpretation, and experiment design. He will also train students who wish to use the microscope independently (i.e. after hours or during other low-use periods).

 
Recharge Rates:
 
 

SEM

FIB

Internal Users:

$30/hour

$45/hour

External Users:

$168/hour

$180/hour

Contact: Dr. Tom Yuzvinsky, yuzvinsky-at-soe.ucsc.edu

 
 
Imaging
 

 

Transmission microscopy using our STEM detector can provide simultaneous surface imaging and sample density characterization.

 

Biological samples can be sputter coated with gold or imaged directly with our environmental mode.

Available Imaging Modes:
 

Primary Applications

Compatible Samples

Secondary electron detection (standard SEM)

Nano- or micro-scale inspection

Dry, conductive samples (insulating samples can be sputter coated)

Scanning transmission electron microscopy (STEM)

Highest resolution inspection and relative density characterization

Nanoparticles on TEM grids, very thin cross-sections

Environmental / low vac mode

Inspection of wet or insulating samples

Any sample suitable for low vacuum

Focused ion beam (FIB) imaging

Visualization of metal grains

Dry, conductive samples

 

Fabrication and Modification

 

 

Samples can be cross-sectioned in situ with the ion beam for subsurface imaging and characterization.

 

Our microscope is equipped with NPGS and a high speed beam blanker for high resolution electron beam lithography.

Platinum, tungsten, and/or silicon oxide can be locally patterned using ion or electron beam induced deposition.

 
Available Fabrication/Modification Modes:
 

Primary Applications

Compatible Samples

High current ion milling

In situ cross-sectioning, large area material removal

Dry, conductive samples

Low current ion milling

Nanopore fabrication, nanoscale material removal

Dry, conductive samples

Ion- or electron beam deposition

Direct deposition of Pt, W, or SiO2

Dry, conductive samples

Electron beam lithography

Pattern writing for subsequent metal deposition or etching

Flat, resist-coated samples

 

Outreach

 

 

In addition to research use, we invite users from the UCSC community and beyond to take advantage of our system for instructional and outreach purposes. Come show your students how fascinating the world can be at the microscale!

 
 

For more information or to schedule a session, please email our staff scientist,
Dr. Tom Yuzvinsky, at yuzvinsky-at-soe.ucsc.edu